OUR PEOPLE
Jason Clevenger
Ph.D.
Practice Director and Principal Scientist
Academic Credentials
- Ph.D., Physical Chemistry, Massachusetts Institute of Technology (MIT), 2002
- B.A., Chemistry, Vanderbilt University, 1995
Professional Honors
- Phi Beta Kappa and Omicron Delta Kappa
- Barry M. Goldwater Foundation Scholarship, Goldwater Excellence in Education Foundation, (1994)
Professional Affiliations
- American Association of Pharmaceutical Scientists—AAPS
- American Chemical Society—ACS
Dr. Clevenger's expertise focuses on materials characterization and process development for specialty manufacturing, with a particular emphasis on regulated products such as medical devices and pharmaceuticals. Dr. Clevenger's physical chemistry experience is applicable to problems involving materials such as semiconductors, MEMS, metal films, dielectrics, polymers, materials processing, materials characterization, pharmaceutical process chemistry, identification of trace contaminants including organics and particulates, and corrosion processes.
His pharmaceutical experience includes process development and optimization for transdermal and solid oral formulations, regulatory compliance and CMC (Chemistry, Manufacturing, and Controls) related issues involving root cause analysis, corrective and preventive action plans and quality assurance. His medical device experience includes method development for regulatory submissions, product development and manufacturing support, and technology due diligence assessment. He has been intimately involved in the development of combination drug/device products as well as litigation matters involving patent infringement, contract manufacturing and business disputes for regulated products.
Dr. Clevenger's characterization background encompasses a broad range of advanced technologies and techniques including laser spectroscopy, X-ray photoelectron spectroscopy (XPS), Auger spectroscopy, Raman, FTIR, solid/liquid-NMR, gas and liquid chromatography (GC/LC) with mass spectrometry (MS), optical emission/absorption spectroscopy, energy dispersive spectroscopy (EDS), white-light interferometry, spectroscopic ellipsometry, atomic force microscopy (AFM), and secondary ion mass spectrometry (SIMS). In addition, he has extensive experience with plasma chemistry and spectroscopy, thin film metrology and reliability, high vacuum technology, and semiconductor processing.
